Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluoro-Trialkoxy-Silane Group and Pure Water as Gas Sources

Engineering & Materials Science

• Silanes 100%
• Chemical vapor deposition 90%
• Oligomers 48%
• Gases 44%
• Water 42%
• Polymerization 37%
• Alcohols 36%
• Byproducts 34%
• Temperature 31%
• Deposition rates 28%
• Electric wiring 24%
• Carbon 16%
• Refractive index 14%
• Vapor pressure 13%
• Etching 12%
• Methanol 11%
• Ethanol 11%
• Aluminum 8%

Chemical Compounds

• Chemical Vapour Deposition 70%
• Flow 50%
• Ambient Reaction Temperature 43%
• Gas 41%
• Purity 39%
• Liquid Film 37%
• Velocity 37%
• Byproduct 33%
• Oligomer 26%
• Carbon Number 26%
• Alkyl Group 21%
• Alcohol 20%
• Polymerization Reaction 20%
• Surface 17%
• Deposition Technique 12%
• Vapor Pressure 11%
• Refractive Index 10%
• Etching 10%
• Dielectric Material 9%
• Ethanol 7%
• Methanol 6%