Formation and characterization of TiO 2 thin films with application to a multifunctional heat mirror

P. Jin, L. Miao, S. Tanemura, G. Xu, M. Tazawa, K. Yoshimura

研究成果: Article査読

48 被引用数 (Scopus)

抄録

Thin films of titanium dioxide (TiO 2 ) with desired crystal phase of anatase or rutile were formed by rf sputtering of a TiO 2 target under precisely controlled process parameters. The application of TiO 2 as the antireflection layers of a TiN-based heat mirror was testified. Optical calculation was done for the heat mirror, and an optimized structure with TiO 2 (30nm)/TiN (30nm)/TiO 2 (30nm) was deposited on SiO 2 glass by sequential sputtering. Optical evaluation of the heat mirror was performed by measuring the transmittance/reflectance with a spectrophotometer in wavelengths 250-2500nm and with a FT-IR system in wavelengths 1-25μm, respectively. Furthermore, it is suggested that a better and a multifunctional performance can mostly be expected through precise control of the crystal structure of the TiO 2 top layer which acts as a photocatalyst.

本文言語English
ページ(範囲)775-781
ページ数7
ジャーナルApplied Surface Science
212-213
SPEC.
DOI
出版ステータスPublished - 2003 5月 15
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 物理学および天文学(全般)
  • 表面および界面
  • 表面、皮膜および薄膜

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