抄録
The growth of high-quality GaN films on sapphire substrates with high-density nanocraters was investigated. The nanocraters were formed on the surface of the substrates in situ a MOCVD reactor by GaN decomposition induced etching. The scanning electron microscopy (SEM), atomic force microscopy (AFM), x-ray diffraction (XRD), Hall measurement and photoluminescence (PL) analysis were used for the characterization of the films. It was observed that the decomposition of GaN induced the decomposition of sapphire, which resulted in the formation of high density nanocraters on its surface.
本文言語 | English |
---|---|
ページ(範囲) | 4041-4043 |
ページ数 | 3 |
ジャーナル | Applied Physics Letters |
巻 | 84 |
号 | 20 |
DOI | |
出版ステータス | Published - 2004 5月 17 |
外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学(その他)