Formation of iron nano-dots by electron beam induced deposition using an ultrahigh vacuum transmission electron microscope

M. Tanaka, F. Chu, M. Shimojo, M. Takeguchi, K. Furuya

研究成果: Conference contribution

抜粋

The fabrication of arrays of iron nano-dots on cleaned Si substrates by electron beam induced deposition (EBID) using ultrahigh vacuum (UHV) transmission electron microscope (TEM) was investigated. The samples were Si(111) slices prepared as TEM specimens by mechanical dimpling followed by chemical etching, with an etchant HNO3. After fabrication and observation of dots, the room temperature (RT)-deposited substrates were annealed at 700K for 1 hour and were observed again. Results show that the spots from the dots form hexagonal with lattice spacing of 0.203±nm and they are rotated about 17.5 degrees from <200> Si.

元の言語English
ホスト出版物のタイトルDigest of Papers - Microprocesses and Nanotechnology 2004
ページ60-61
ページ数2
出版物ステータスPublished - 2004 12 1
イベント2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan
継続期間: 2004 10 262004 10 29

出版物シリーズ

名前Digest of Papers - Microprocesses and Nanotechnology 2004

Conference

Conference2004 International Microprocesses and Nanotechnology Conference
Japan
Osaka
期間04/10/2604/10/29

    フィンガープリント

ASJC Scopus subject areas

  • Engineering(all)

これを引用

Tanaka, M., Chu, F., Shimojo, M., Takeguchi, M., & Furuya, K. (2004). Formation of iron nano-dots by electron beam induced deposition using an ultrahigh vacuum transmission electron microscope. : Digest of Papers - Microprocesses and Nanotechnology 2004 (pp. 60-61). (Digest of Papers - Microprocesses and Nanotechnology 2004).