Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams

M. Tanaka, F. Chu, M. Shimojo, M. Takeguchi, K. Mitsuishi, K. Furuya

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.

本文言語English
ページ(範囲)2667-2671
ページ数5
ジャーナルJournal of Materials Science
41
9
DOI
出版ステータスPublished - 2006 5 1
外部発表はい

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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