抄録
Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.
本文言語 | English |
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ページ(範囲) | 2667-2671 |
ページ数 | 5 |
ジャーナル | Journal of Materials Science |
巻 | 41 |
号 | 9 |
DOI | |
出版ステータス | Published - 2006 5月 1 |
外部発表 | はい |
ASJC Scopus subject areas
- 材料科学(全般)
- 材料力学
- 機械工学