抜粋
Electron-beam induced chemical vapor deposition (EBI-CVD) of Fe(CO) 5 was performed on both Si (111) and (110) substrates at 673-873 K inside an ultrahigh vacuum transmission electron microscope. The formation of iron silicide islands was observed on both substrates. Cubic silicide nano-rods were formed on Si(111) substrates by EBI-CVD with focused electron beams. The formation of β-FeSi2 islands was mainly observed on Si(110) substrates by EBI-CVD when the electron beam was broadly spread. It was shown that the size and the intensity of the electron beam played a significant role in EBI-CVD and affected the CVD process extensively.
| 元の言語 | English |
|---|---|
| ページ（範囲） | 2667-2671 |
| ページ数 | 5 |
| ジャーナル | Journal of Materials Science |
| 巻 | 41 |
| 発行部数 | 9 |
| DOI | |
| 出版物ステータス | Published - 2006 5 1 |
| 外部発表 | Yes |
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering
フィンガープリント Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。
これを引用
Tanaka, M., Chu, F., Shimojo, M., Takeguchi, M., Mitsuishi, K., & Furuya, K. (2006). Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams. Journal of Materials Science, 41(9), 2667-2671. https://doi.org/10.1007/s10853-006-7868-x