TY - JOUR
T1 - Graded TiN coating by supersonic free-jet PVD combined with reactive plasma
AU - Yumoto, Atsushi
AU - Yamamoto, Takahisa
AU - Hiroki, Fujio
AU - Shiota, Ichiro
AU - Niwa, Naotake
PY - 2002/11
Y1 - 2002/11
N2 - Ceramic coating is a very popular technology for improving the properties of structural materials. A titanium nitride (TIN) coating is a typical example and has been widely applied to cutting tools, electronic devices and many other fields utilizing its superior physical properties. This paper sought to produce a graded TiN coating on a Ti substrate by combining Supersonic Free-Jet PVD (SFJ-PVD) with a reactive plasma-metal reaction technique. The authors have developed SFJ-PVD as a new coating method in which a coating film is formed by depositing nanoparticles with very high velocity onto a substrate. SFJ-PVD can provide a high deposition rate and thick film coating. Gradually changing the nitrogen flow rate during deposition produces a graded TiN coating, in which composition changes gradually from pure Ti to TiN. A monolithic TiN coating is also produced with SFJ-PVD. XRD analysis of the graded TiN detected peaks for Ti, Ti2N and TiN, while only a TiN peak is observed in the monolithic TiN coating. EPMA analysis of a graded coating reveals a gradual compositional change from pure Ti to TiN. Few pores or cracks are observed in a graded TiN or in a monolithic TiN formed under the optimized conditions of SFJ-PVD.
AB - Ceramic coating is a very popular technology for improving the properties of structural materials. A titanium nitride (TIN) coating is a typical example and has been widely applied to cutting tools, electronic devices and many other fields utilizing its superior physical properties. This paper sought to produce a graded TiN coating on a Ti substrate by combining Supersonic Free-Jet PVD (SFJ-PVD) with a reactive plasma-metal reaction technique. The authors have developed SFJ-PVD as a new coating method in which a coating film is formed by depositing nanoparticles with very high velocity onto a substrate. SFJ-PVD can provide a high deposition rate and thick film coating. Gradually changing the nitrogen flow rate during deposition produces a graded TiN coating, in which composition changes gradually from pure Ti to TiN. A monolithic TiN coating is also produced with SFJ-PVD. XRD analysis of the graded TiN detected peaks for Ti, Ti2N and TiN, while only a TiN peak is observed in the monolithic TiN coating. EPMA analysis of a graded coating reveals a gradual compositional change from pure Ti to TiN. Few pores or cracks are observed in a graded TiN or in a monolithic TiN formed under the optimized conditions of SFJ-PVD.
KW - Functionally graded material
KW - Nanoparticle
KW - Physical vapor deposition
KW - Supersonic gas flow
KW - Titanium nitride
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U2 - 10.2320/matertrans.43.2932
DO - 10.2320/matertrans.43.2932
M3 - Article
AN - SCOPUS:0036873302
SN - 1345-9678
VL - 43
SP - 2932
EP - 2994
JO - Materials Transactions
JF - Materials Transactions
IS - 11
ER -