Growth of 100-mm-diameter AlGaN/GaN heterostructures on sapphire substrates by MOVPE

M. Miyoshi, H. Ishikawa, T. Egawa, T. Jimbo

研究成果: Conference article査読

2 被引用数 (Scopus)

抄録

For the purpose of the practical use of GaN-based electronic devices, we demonstrated the growth of 100-mm-diameter AlGaN/GaN heterostructures on c-face sapphire substrates by metalorganic vapor phase epitaxy (MOVPE). The obtained films have specular surface, good crystal quality and good uniformity of the Al composition across the entire epitaxial wafer. These epitaxial wafers showed a relatively high electron mobility, 1320 ± 80 cm2/Vs with the sheet carrier concentration of 8.4 ± 0.5 × 1012/cm 3 at room temperature, across the entire epitaxial wafer. High-electron-mobility transistors (HEMTs) fabricated on the 100-mm-diameter epitaxial wafer also exhibited good dc characteristics. Typical values of the peak extrinsic transconductance and the maximum drain current density were 200 mS/mm and 534 mA/mm, respectively, for the device with the gate length of 2.0 μm and the gate width of 15.0 μm.

本文言語English
ページ(範囲)2091-2094
ページ数4
ジャーナルPhysica Status Solidi C: Conferences
7
DOI
出版ステータスPublished - 2003 12 1
外部発表はい
イベント5th International Conference on Nitride Semiconductors, ICNS 2003 - Nara, Japan
継続期間: 2003 5 252003 5 30

ASJC Scopus subject areas

  • Condensed Matter Physics

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