H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O assisted O3 Plasma Treatment

K.Kishimoto K.Kishimoto, K.Imaoka K.Imaoka, K.Koyanagi K.Koyanagi, T.Homma T.Homma, Tetsuya Homma

研究成果: Article

元の言語English
ページ(範囲)168-170
ジャーナルExtended Abstract of International Conference on Solid State Devices and Materials (SSDM)
出版物ステータスPublished - 1995 8 21

これを引用

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title = "H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O assisted O3 Plasma Treatment",
author = "K.Kishimoto K.Kishimoto and K.Imaoka K.Imaoka and K.Koyanagi K.Koyanagi and T.Homma T.Homma and Tetsuya Homma",
year = "1995",
month = "8",
day = "21",
language = "English",
pages = "168--170",
journal = "Extended Abstract of International Conference on Solid State Devices and Materials (SSDM)",

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TY - JOUR

T1 - H2O-TOP-PECVD: A New Plasma Enhanced CVD Technology Using Alternate TEOS-Ozone Low Pressure CVD and H2O assisted O3 Plasma Treatment

AU - K.Kishimoto, K.Kishimoto

AU - K.Imaoka, K.Imaoka

AU - K.Koyanagi, K.Koyanagi

AU - T.Homma, T.Homma

AU - Homma, Tetsuya

PY - 1995/8/21

Y1 - 1995/8/21

M3 - Article

SP - 168

EP - 170

JO - Extended Abstract of International Conference on Solid State Devices and Materials (SSDM)

JF - Extended Abstract of International Conference on Solid State Devices and Materials (SSDM)

ER -