High temperature propylene permselective membrane prepared by counter diffusion CVD

Emi Matsuyama, Keisuke Utsumi, Ayumi Ikeda, Mikihiro Nomura

研究成果: Article

2 引用 (Scopus)

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High C3H6 permselective silica hybrid membranes were successfully prepared by counter diffusion CVD. Propyltrimethoxysilane (PrTMOS), phenyltrimethoxysilane (PhTMOS) and hexyltrimethoxysilane (HTMOS) were employed as silica precursors. C3H6/C3H8 permeance ratio was 414 (C3H6 permeance 1.0 ×10-8 mol m-2 s-1 Pa-1) through the membrane deposited at 450°C for 5 min by using HTMOS as silica source. The optimum deposition temperature was 450°C for the HTMOS/O2 system to obtain a high C3H6 permselective membrane. HTMOS was selected from among the three silica precursors due to its high thermal stability. N2/SF6 permeance ratio decreased from 64 to 12 with increasing deposition period from 5 to 90 min. N2/SF6 permeance ratio showed the maximum at 2.2 × 105 through the membrane deposited at 450°C for 5 min.

元の言語English
ページ(範囲)301-306
ページ数6
ジャーナルKAGAKU KOGAKU RONBUNSHU
39
発行部数4
DOI
出版物ステータスPublished - 2013 7 31

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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