Improvement of smooth surface of RuO₂ bottom electrode on Al₂O₃ buffer layer and characteristics of RuO₂/TiO₂/Al₂O₃/TiO₂/RuO₂ capacitors

Tomomi Sawada, Toshihide Nabatame, Thang Duy Dao, Ippei Yamamoto, Kazunori Kurishima, Takashi Onaya, Akihiko Ohi, Kazuhiro Ito, Makoto Takahashi, Kazuyuki Kohama, Tomoji Ohishi, Atsushi Ogura, Tadaaki Nagao