Improvements of the lateral resolution of the MFM technique

M. R. Koblischka, U. Hartmann, T. Sulzbach

研究成果: Conference article査読

34 被引用数 (Scopus)

抄録

We report on the preparation of high-resolution magnetic force microscopy (MFM) tips using the electron beam deposition method for MFM measurements on soft magnetic samples. Electron beam lithography using a scanning electron microscope was used to define small particles of magnetic material at the very end of a commercial scanning microscope tip to achieve maximum lateral resolution with low magnetic moment. Several approaches were tried out and demonstrated on permalloy thin films. The achieved resolution (down to 20 nm) is clearly proven by the fact that more details of the magnetic structure can be observed. However, it turned out that no standard exists in order to reliably determine the resolution of the MFM measurements; the development of such a standard will be a very important new task.

本文言語English
ページ(範囲)93-97
ページ数5
ジャーナルThin Solid Films
428
1-2
DOI
出版ステータスPublished - 2003 3 20
外部発表はい
イベントProceedings of Symposium J on Growth and Evolution - Strasbourg, France
継続期間: 2002 6 182002 6 21

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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