In-situ ion and electron beam effects on the fabrication and analysis of nanomaterials

Kazuo Furuya, Minghui Song, Masayuki Shimojo

研究成果: Chapter

1 引用 (Scopus)

抜粋

Ion implantation causes the formation of nano-phases as well as radiation damage. “In-situ” observation in a TEM is a unique technique to clarify such phenomena. One example is Xe nanocrystals embedded in a metal matrix. HRTEM observations revealed the atomic structures and the motion of atoms in a Xe nanocrystal. Electron beam-induced deposition is another technique to fabricate nano-structures. Nanostructures having desired shape and size can be obtained. Metal atoms are deposited using focused electron beam irradiation under the presence of a small amount of precursor gas molecules on the substrate. The details of these ion and electron beam effects are reviewed.

元の言語English
ホスト出版物のタイトルIn-Situ Electron Microscopy at High Resolution
出版者World Scientific Publishing Co.
ページ229-258
ページ数30
ISBN(電子版)9789812797346
ISBN(印刷物)9812797335, 9789812797339
DOI
出版物ステータスPublished - 2008 1 1

ASJC Scopus subject areas

  • Engineering(all)
  • Materials Science(all)

フィンガープリント In-situ ion and electron beam effects on the fabrication and analysis of nanomaterials' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Furuya, K., Song, M., & Shimojo, M. (2008). In-situ ion and electron beam effects on the fabrication and analysis of nanomaterials. : In-Situ Electron Microscopy at High Resolution (pp. 229-258). World Scientific Publishing Co.. https://doi.org/10.1007/9789812797346_0007