We have investigated the thermoelectric properties of 2% Al-doped ZnO (AZO) thin films depending on the postdeposition cooling atmosphere [in oxygen pressure (AZO-O) or vacuum (AZO-V)]. Thin films were grown by pulsed laser deposition on sapphire (Al2O3) substrates at various deposition temperatures (400∘C to 600∘C). All films were c-axis oriented. The electrical conductivity of AZO-V thin films was higher than that of AZO-O thin films across the whole temperature range from 300 K to 600 K, due to the optimal carrier concentration (1020cm-3) of AZO-V samples. Furthermore, the thermoelectric performance of AZO-V films increased with the deposition temperature; for instance, the highest power factor of 0.87 ×10-3Wm-1K-2 and dimensionless figure of merit of 0.07 at 600 K were found for AZO-V thin film deposited at 600∘C.
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