Infrared absorption study of CO chemisorption on copper island films

H. Seki, M. Takada, T. Tanabe, T. Wadayama, A. Hatta

研究成果: Article査読

18 被引用数 (Scopus)

抄録

The infrared absorption spectra of chemisorbed CO at 90 K on copper island films deposited by electron-beam evaporation onto surface-oxidized silicon substrates have been measured at normal incidence of radiation. The integrated absorption intensity of the C-O stretch mode at saturation of CO adsorption depends on both the mass thickness of copper and the substrate temperature during copper deposition. The observed CO absorption features are quite different from those observed on bulk single crystals and thick polycrystalline films. The FE-SEM images reveal that at a given mass thickness the islands are larger when deposited at 296 K than when deposited at 473 K. This difference is reflected in the mass thickness dependence of the absorption intensity; the maximum absorption intensity is obtained at a thickness of 9 nm when deposited at 296 K, whereas the corresponding thickness is 16 nm when deposited at 473 K. A feature common to both films is partial aggregation of the islands. The integrated absorption intensity of the C-O stretch mode observed on the 16 nm film is 5 times larger than that observed on the bulk Cu(1 0 0) surface. This absorption enhancement is attributed to the transverse collective electron resonance of the copper islands.

本文言語English
ページ(範囲)23-32
ページ数10
ジャーナルSurface Science
506
1-2
DOI
出版ステータスPublished - 2002 5 10
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

フィンガープリント

「Infrared absorption study of CO chemisorption on copper island films」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル