An interferometric optical isolator, with a Si guiding layer, employing a nonreciprocal phase shift was studied. The optical isolator was comprised of a magneto-optic waveguide with a magnetic garnet / Si / SiO2 structure, which was fabricated by wafer bonding technique. An optical interferometer had distinct layer structures so that a unidirectional magnetic field could be applied to the optical isolator. The optical isolator employing the nonreciprocal phase shift was designed at a wavelength of 1.55 μm. The required propagation distance of the interferometer was approximately 1 mm for isolator operation.
|出版ステータス||Published - 2005 12月 1|
|イベント||207th ECS Meeting - Quebec, Canada|
継続期間: 2005 5月 16 → 2005 5月 20
|Conference||207th ECS Meeting|
|Period||05/5/16 → 05/5/20|
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