Investigation of hydrogen storage using combinatorial thin films and ir imaging

Hiroyuki Oguchi, Ichiro Takeuchi, Daniel Josell, Edwin J. Heilweil, Leonid A. Bendersky

研究成果: Conference article査読

抄録

Three 100 nm-thick Mg x(TM) 1.x (TM = Ni and Ti) composition spread thin films having compositional variation 0.4<x<0.95 and capped with a 5 nm-thick Pd layer were deposited in combinatorial electron-beam (e-beam) deposition chamber. Crystallinity of the films was characterized by scanning x-ray diffraction (XRD) and cross-sectional transmission electron microscopy (TEM). Hydrogen absorption and desorption of the films were monitored with an infrared (IR) camera that could image a full area of the films. The observed changes in JR intensity due to hydrogen absorption/desorption demonstrated sensitivity of the method to the differences in compostion, microstructure and type of TM.

本文言語English
ページ(範囲)1-5
ページ数5
ジャーナルMaterials Research Society Symposium Proceedings
1042
出版ステータスPublished - 2008
外部発表はい
イベントMaterials and Technology for Hydrogen Storage - Boston, MA, United States
継続期間: 2007 11 262007 11 30

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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