Ion damage during preparation of nanostructures in magnetite by means of focused ion-beam (FIB) milling

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Nanostructures are prepared into magnetite (Fe3O4) thin films on (0 0 1) MgO substrates by means of focused ion-beam (FIB) milling. The resulting ion damage is analyzed using electron backscatter diffraction (EBSD), enabling the determination of crystal orientation with a spatial resolution of about 40 nm. Depending on the ion currents and radiation dose applied during the FIB milling, different types of damage are observed. At high ion currents, an entire ring area around the nanostructure is affected by the ion beam. The EBSD analysis reveals that new, small grains with a different orientation pattern are created within the ring area. At small ion currents, proper nanostructures can be created with only minimal damage to the remainder of the film.

本文言語English
ページ(範囲)468-475
ページ数8
ジャーナルSuperlattices and Microstructures
44
4-5
DOI
出版ステータスPublished - 2008 10月
外部発表はい

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 電子工学および電気工学

フィンガープリント

「Ion damage during preparation of nanostructures in magnetite by means of focused ion-beam (FIB) milling」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル