Key mechanism for improved EM lifetime of CoWP capped Cu interconnects

Y. Kakuhara, Y. Kakuhara;N. Kawahara;K.Ueno, N.Oda N.Oda, Kazuyoshi Ueno

研究成果: Article

元の言語English
ページ(範囲)144-145
ジャーナルEntended Abstracts of the 2006 Int. Conf, on Solid State Dev. and Mat.
出版物ステータスPublished - 2006 9 13

これを引用

Key mechanism for improved EM lifetime of CoWP capped Cu interconnects. / Kakuhara, Y.; Kawahara;K.Ueno, Y. Kakuhara;N.; N.Oda, N.Oda; Ueno, Kazuyoshi.

:: Entended Abstracts of the 2006 Int. Conf, on Solid State Dev. and Mat., 13.09.2006, p. 144-145.

研究成果: Article

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