Laser-scanning direction effect in femtosecond laser-assisted etching

Shigeki Matsuo, Yoshifumi Umeda, Takuro Tomita, Shuichi Hashimoto

研究成果: Article査読

2 被引用数 (Scopus)

抄録

In this study we examined how the laser-scanning direction during the inscription of modified lines affects to the etching rate along the lines in the femtosecond laser-assisted etching. An isotropic material (silica) was used as the sample. Circular polarization was used for inscribing modified lines, in order to avoid a direction effect arising from polarization. Scanning direction dependence was observed in the etching rate along the modified lines. The relation between the occurrence of a scanning direction effect and the other inscribing pa-rameters (pitch and pulse energy) was examined.

本文言語English
ページ(範囲)35-38
ページ数4
ジャーナルJournal of Laser Micro Nanoengineering
8
1
DOI
出版ステータスPublished - 2013 1
外部発表はい

ASJC Scopus subject areas

  • Instrumentation
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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