Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching

Hideki Yokoi, Tetsuya Mizumoto, Takehiro Ida, Kazuki Kozakai Kozakai, Yoshiyuki Naito

研究成果: Article

抄録

Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.

元の言語English
ページ(範囲)635-639
ページ数5
ジャーナルJapanese Journal of Applied Physics
33
発行部数11R
DOI
出版物ステータスPublished - 1994
外部発表Yes

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Etching
etching
Masks
masks
Waveguides
waveguides
propagation
Garnets
Chemical shift
Ion bombardment
garnets
Light absorption
chemical equilibrium
bombardment
surface layers
slabs
optical absorption
X ray photoelectron spectroscopy
photoelectron spectroscopy
causes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

これを引用

Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching. / Yokoi, Hideki; Mizumoto, Tetsuya; Ida, Takehiro; Kozakai, Kazuki Kozakai; Naito, Yoshiyuki.

:: Japanese Journal of Applied Physics, 巻 33, 番号 11R, 1994, p. 635-639.

研究成果: Article

Yokoi, Hideki ; Mizumoto, Tetsuya ; Ida, Takehiro ; Kozakai, Kazuki Kozakai ; Naito, Yoshiyuki. / Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching. :: Japanese Journal of Applied Physics. 1994 ; 巻 33, 番号 11R. pp. 635-639.
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AU - Yokoi, Hideki

AU - Mizumoto, Tetsuya

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AU - Kozakai, Kazuki Kozakai

AU - Naito, Yoshiyuki

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