Low-resistance metal contacts for nanocarbon/cobalt interconnects

Kazuyoshi Ueno, Masashi Takagi, Hiroaki Yano, Taichi Wakui, Yuichi Yamazaki, Naoshi Sakuma, Akihiro Kajita, Tadashi Sakai

研究成果: Article

3 引用 (Scopus)

抜粋

Low-resistance metal contacts for CVD-nanocarbon (NC)/cobalt (Co) interconnects have been investigated among contact metals such as Ni, Ti, Au, and Cu. Contact resistivity was independent of contact area owing to low-resistance NC/Co interconnect structure. The lowest contact resistivity and superior adhesion were obtained from Ni. Although the factors for the low contact resistivity were not clear enough from the comparison of work-function difference and adhesion strength for the contact metals, Ni is a promising low-resistivity contact metal for CVD-NC interconnects in the future.

元の言語English
記事番号05FD01
ジャーナルJapanese Journal of Applied Physics
52
発行部数5 PART 4
DOI
出版物ステータスPublished - 2013 5 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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  • これを引用

    Ueno, K., Takagi, M., Yano, H., Wakui, T., Yamazaki, Y., Sakuma, N., Kajita, A., & Sakai, T. (2013). Low-resistance metal contacts for nanocarbon/cobalt interconnects. Japanese Journal of Applied Physics, 52(5 PART 4), [05FD01]. https://doi.org/10.7567/JJAP.52.05FD01