TY - JOUR
T1 - Luminescence properties of sol-gel synthesized silica glass induced by an ArF excimer laser
AU - Mukasa, K.
AU - Ono, M.
AU - Wakabayashi, R.
AU - Ishii, K.
AU - Ohki, Y.
AU - Nishikawa, H.
PY - 1997/1/21
Y1 - 1997/1/21
N2 - When sol-gel synthesized silica glass containing about 260 ppm of OH groups is irradiated with an ArF excimer laser, photoluminescence appears at 1.9 eV (650 nm). From measurements of luminescence lifetime, the absorption spectrum and electron-spin-resonance spectroscopy, the luminescence is thought to be due to a non-bridging oxygen hole centre, a kind of point defect in silica glass.
AB - When sol-gel synthesized silica glass containing about 260 ppm of OH groups is irradiated with an ArF excimer laser, photoluminescence appears at 1.9 eV (650 nm). From measurements of luminescence lifetime, the absorption spectrum and electron-spin-resonance spectroscopy, the luminescence is thought to be due to a non-bridging oxygen hole centre, a kind of point defect in silica glass.
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U2 - 10.1088/0022-3727/30/2/017
DO - 10.1088/0022-3727/30/2/017
M3 - Article
AN - SCOPUS:0030825010
VL - 30
SP - 283
EP - 285
JO - Journal Physics D: Applied Physics
JF - Journal Physics D: Applied Physics
SN - 0022-3727
IS - 2
ER -