Massively parallel electron beam direct writing (MPEBDW) system based on micro-electro-mechanical system (MEMS) /nanocrystallineSi emitter array

A. Kojima, N. Ikegami, T. Yoshida, H. Miyaguchi, M. Muroyama, H. Nishino, S. Yoshida, M. Sugata, H. Ohyi, N. Koshida, M. Esashi

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

The characteristics of a prototype massively parallel electron beam direct writing (MPEBDW) system are demonstrated. The electron optics consist of an emitter array, a micro-electro-mechanical system (MEMS) condenser lens array, auxiliary lenses, a stigmator, three-stage deflectors to align and scan the parallel beams, and an objective lens acting as a reduction lens. The emitter array produces 10000 programmable 10 μm square beams. The electron emitter is a nanocrystalline silicon (nc-Si) ballistic electron emitter array integrated with an active matrix driver LSI for high-speed emission current control. Because the LSI also has a field curvature correction function, the system can use a large electron emitter array. In this system, beams that are incident on the outside of the paraxial region of the reduction lens can also be used through use of the optical aberration correction functions. The exposure pattern is stored in the active matrix LSI's memory. Alignment between the emitter array and the condenser lens array is performed by moving the emitter stage that slides along the x- and y-axes, and rotates around the z-theta axis. The electrons of all beams are accelerated, and pass through the anode array. The stigmator and the two-stage deflectors perform fine adjustments to the beam positions. The other deflector simultaneously scans all parallel beams to synchronize the moving target stage. Exposure is carried out by moving the target stage that holds the wafer. The reduction lens focuses all beams on the target wafer surface, and the electron optics of the column reduces the electron image to 0.1% of its original size.

本文言語English
ホスト出版物のタイトルAlternative Lithographic Technologies VI
出版社SPIE
ISBN(印刷版)9780819499721
DOI
出版ステータスPublished - 2014
外部発表はい
イベントAlternative Lithographic Technologies VI - San Jose, CA, United States
継続期間: 2014 2月 242014 2月 27

出版物シリーズ

名前Proceedings of SPIE - The International Society for Optical Engineering
9049
ISSN(印刷版)0277-786X
ISSN(電子版)1996-756X

Conference

ConferenceAlternative Lithographic Technologies VI
国/地域United States
CitySan Jose, CA
Period14/2/2414/2/27

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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