Material and process challenges for interconnects in nanoelectronics era

研究成果: Conference contribution

5 被引用数 (Scopus)

抄録

Cu/low-k interconnects have been used in LSI fabrication. However, several difficult challenges need to be overcome for 22-nm node devices and beyond. These challenges include an increase in resistivity, degradation of the electromigration reliability, and the low mechanical strength of low-k dielectrics. To overcome these problems, it is essential to not only improve Cu/low-k fabrication processes but also to develop alternative approaches based on emerging technologies such as 3D interconnects, nanocarbon interconnects, and optical interconnects. This paper reviews the problems and potential solutions, and describes approaches such as supercritical (SC) annealing for grain growth enhancement, CoWP caps for electromigration (EM) reliability improvement, and electroless barrier deposition for ultrathin barrier layer.

本文言語English
ホスト出版物のタイトルProceedings of 2010 International Symposium on VLSI Technology, System and Application, VLSI-TSA 2010
ページ64-65
ページ数2
DOI
出版ステータスPublished - 2010 10 20
イベント2010 International Symposium on VLSI Technology, System and Application, VLSI-TSA 2010 - Hsin Chu, Taiwan, Province of China
継続期間: 2010 4 262010 4 28

出版物シリーズ

名前Proceedings of 2010 International Symposium on VLSI Technology, System and Application, VLSI-TSA 2010

Conference

Conference2010 International Symposium on VLSI Technology, System and Application, VLSI-TSA 2010
CountryTaiwan, Province of China
CityHsin Chu
Period10/4/2610/4/28

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Hardware and Architecture

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