Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

Ersyzario Edo Yunata; Tatsuhiko Aizawa

doi:10.1016/j.mfglet.2016.05.001

Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching

Ersyzario Edo Yunata, Tatsuhiko Aizawa

研究成果: Article › 査読

7 被引用数 (Scopus)

抄録

Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 10¹⁷ to 10¹⁸ m^-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

本文言語	English
ページ（範囲）	16-20
ページ数	5
ジャーナル	Manufacturing Letters
巻	8
DOI	https://doi.org/10.1016/j.mfglet.2016.05.001
出版ステータス	Published - 2016 4 1

ASJC Scopus subject areas

Mechanics of Materials
Industrial and Manufacturing Engineering

文献へのアクセス

10.1016/j.mfglet.2016.05.001

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引用スタイル

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title = "Micro-grooving into thick CVD diamond films via hollow-cathode oxygen plasma etching",

abstract = "Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.",

keywords = "CVD diamond coating, High etching rate, Hollow-cathode oxygen plasma, Micro-grooving, Plasma etching",

author = "Yunata, {Ersyzario Edo} and Tatsuhiko Aizawa",

note = "Funding Information: The authors would like express their gratitude to Mrs. Ueda (Fujikoshi, Co. Ltd.) for preparation of CVD-diamond coated WC (Co) specimens and to Ms. Miura (Renishaw, Co. Ltd.) for Raman spectroscopy. This study was financially supported in part by the MEXT program with the contracts of #41101. Publisher Copyright: {\textcopyright} 2016 Society of Manufacturing Engineers (SME). Copyright: Copyright 2017 Elsevier B.V., All rights reserved.",

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AU - Yunata, Ersyzario Edo

AU - Aizawa, Tatsuhiko

N1 - Funding Information: The authors would like express their gratitude to Mrs. Ueda (Fujikoshi, Co. Ltd.) for preparation of CVD-diamond coated WC (Co) specimens and to Ms. Miura (Renishaw, Co. Ltd.) for Raman spectroscopy. This study was financially supported in part by the MEXT program with the contracts of #41101. Publisher Copyright: © 2016 Society of Manufacturing Engineers (SME). Copyright: Copyright 2017 Elsevier B.V., All rights reserved.

PY - 2016/4/1

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N2 - Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

AB - Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.

KW - CVD diamond coating

KW - High etching rate

KW - Hollow-cathode oxygen plasma

KW - Micro-grooving

KW - Plasma etching

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