抄録
Hollow-cathode oxygen plasma etching was proposed as a promising means to make micro-texturing into CVD diamond coatings. Oxygen ions and electrons were confined in the hollow-cathode to have higher ion and electron densities in the order of 1017 to 1018 m-3 in the inside of hollow-cathode. Quantitative plasma diagnosis proved that direct reaction of oxygen atom or radicals with carbon in the diamond coating should drive the reactive ion etching (RIE) process. A diamond-coated WC (Co) disc specimen was employed to describe the RIE-behavior with aid of stainless steel mask with the line width of 100 μm. Surface depth profile measurement as well as the Raman spectroscopy demonstrated that a micro-groove was precisely etched into the diamond film as a sharp-edged profile.
本文言語 | English |
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ページ(範囲) | 16-20 |
ページ数 | 5 |
ジャーナル | Manufacturing Letters |
巻 | 8 |
DOI | |
出版ステータス | Published - 2016 4月 1 |
ASJC Scopus subject areas
- 材料力学
- 産業および生産工学