Micro-machining of resists on silicon by proton beam writing

Naoyuki Uchiya, Takuya Harada, Masato Murai, Hiroyuki Nishikawa, Junji Haga, Takahiro Sato, Yasuyuki Ishii, Tomihiro Kamiya

研究成果: Article査読

43 被引用数 (Scopus)

抄録

We report micro-machining of resists on silicon by proton beam writing (PBW) at Takasaki Ion Accelerators for Advanced Radiation Application (TIARA), JAEA Takasaki, Japan. We studied the proton beam irradiation effects on typical positive and negative resists such as PMMA and SU-8, respectively, for application of the PBW technique to micro-machining. These resist materials were subjected to the scanning of a focused beam of protons accelerated using the microbeam facility of TIARA. Diameter of the proton beam was focused to about 1 μm. The fluence was varied to examine the irradiation effects on these resists as a function of the beam current and irradiation time. After exposure to proton beam, samples were developed and evaluated by a scanning electron microscope. Attempts to fabricate nickel stamps were also made by electroplating on the structures formed by PBW for application to imprint lithography.

本文言語English
ページ(範囲)405-408
ページ数4
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
260
1
DOI
出版ステータスPublished - 2007 7

ASJC Scopus subject areas

  • 核物理学および高エネルギー物理学
  • 器械工学

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