Micro-Nano Lithography by MeV Ion Beam Writing

Katsuyoshi Takano; Takahiro Satoh; Yasuyuki Ishii; Tomihiro Kamiya; Takeru Ohkubo; Masaki Sugimoto; Masashi Koka; Hiroyuki Nishikawa; Syu Seki

Micro-Nano Lithography by MeV Ion Beam Writing

Katsuyoshi Takano, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Takeru Ohkubo, Masaki Sugimoto, Masashi Koka, Hiroyuki Nishikawa, Syu Seki

研究成果: Article › 査読

本文言語	English
ジャーナル	Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009)
出版ステータス	Published - 2009 9月 1

引用スタイル

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T1 - Micro-Nano Lithography by MeV Ion Beam Writing

AU - Takano, Katsuyoshi

AU - Satoh, Takahiro

AU - Ishii, Yasuyuki

AU - Kamiya, Tomihiro

AU - Ohkubo, Takeru

AU - Sugimoto, Masaki

AU - Koka, Masashi

AU - Nishikawa, Hiroyuki

AU - Seki, Syu

PY - 2009/9/1

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JF - Proceedings of the 16th International Conference on Surface Modification of Materials by Ion Beams (SMMIB2009-September 13-18, 2009)

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