Micro-pattering of siloxane films by proton beam writing

Hiroyuki Nishikawa, Ryutaro Tsuchiya, Tetsuro Yasukawa, Tomoki Kaneko, Yusuke Furuta, Tomoji Ohishi

研究成果: Article査読

6 被引用数 (Scopus)

抄録

Micropatterning of two types of siloxane films, HSQ and SOG was studied by 1.0 MeV focused proton beam. FT-IR measurements show the transformation of the Si-O-Si structures in siloxane to networked structures after proton beam writing. Both the HSQ and SOG are negative resist for 1.0 MeV proton beam. Lines with smooth sidewalls were written by proton beam writing for both HSQ and SOG. Vertical sidewall is observed for HSQ, while it is tapered for SOG.

本文言語English
ページ(範囲)239-243
ページ数5
ジャーナルJournal of Photopolymer Science and Technology
22
2
DOI
出版ステータスPublished - 2009

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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