Micro-patterning of Siloxane Films by Proton Beam Writing

Hiroyuki Nishikawa, Ryutaro Tsuchiya, Tetsuro Yasukawa, Tomoki Kaneko, Yusuke Furuta, Tomoji Ohishi

研究成果: Article › 査読

本文言語	English
ページ（範囲）	239-243
ジャーナル	Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009)
巻	22
出版ステータス	Published - 2009 6月 1

引用スタイル

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title = "Micro-patterning of Siloxane Films by Proton Beam Writing",

author = "Hiroyuki Nishikawa and Ryutaro Tsuchiya and Tetsuro Yasukawa and Tomoki Kaneko and Yusuke Furuta and Tomoji Ohishi",

year = "2009",

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T1 - Micro-patterning of Siloxane Films by Proton Beam Writing

AU - Nishikawa, Hiroyuki

AU - Tsuchiya, Ryutaro

AU - Yasukawa, Tetsuro

AU - Kaneko, Tomoki

AU - Furuta, Yusuke

AU - Ohishi, Tomoji

PY - 2009/6/1

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JO - Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009)

JF - Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009)

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