Micro structure of N-implanted Ti thin films prepared by ion beam sputtering deposition

Engineering & Materials Science

• Ion beams 89%
• Sputtering 80%
• Diffraction patterns 59%
• Thin films 59%
• Nitrides 50%
• Substrates 44%
• Microstructure 42%
• Nitrogen 38%
• Ions 38%
• Chemical shift 35%
• Sputter deposition 34%
• Grain growth 26%
• Nanostructured materials 26%
• Thick films 25%
• X ray photoelectron spectroscopy 25%
• Transmission electron microscopy 21%
• Annealing 20%
• Titanium 20%
• Textures 16%
• Temperature 16%

Chemical Compounds

• Ion Beam Sputtering 100%
• Microstructure 42%
• Liquid Film 30%
• Nitride 30%
• Sputter Deposition 22%
• Grain Growth 19%
• Nitrogen 19%
• Ion Beam 17%
• Crystalline Texture 15%
• Tetragonal Space Group 13%
• Chemical Shift 12%
• Annealing 12%
• Dose 12%
• Nanomaterial 9%
• Pressure 9%
• Ambient Reaction Temperature 8%
• Purity 7%
• Energy 7%
• Ion 6%