Micro-structuring of PVDF-TrFE by proton beam writing for tactile sensors

Yoshitaka Nojiri, Hidetaka Hayashi, Yasuyuki Ishii, Hiroyuki Nishikawa

研究成果: Conference contribution

抄録

Aiming at micro-structuring of Polyvinylidene fluoride trifluoroethylene (PVDF-TrFE) film for sensing applications, we studied effects of proton beam irradiation and subsequent alkaline etching processes using potassium hydroxide (KOH) solution. Dependence of the pattering depth and linewidth on the beam energy, fluence, and etching time was investigated. The depth of pattering is mainly determined by etching time for PBW with beam energy of a few MeV and with fluence of less than 10 µC/mm2. By using a moderate fluence of 3.0 µC/mm2 and etching time of 3 h with beam energy of 1.7 MeV, we obtained 4 x 4 arrays of 40 µm height pillars with aspect ratio of about 5.

本文言語English
ホスト出版物のタイトルProceedings of 2020 International Symposium on Electrical Insulating Materials, ISEIM 2020
出版社Institute of Electrical Engineers of Japan
ページ447-450
ページ数4
ISBN(電子版)9784886864185
出版ステータスPublished - 2020 9 13
イベント2020 International Symposium on Electrical Insulating Materials, ISEIM 2020 - Virtual, Tokyo, Japan
継続期間: 2020 9 132020 9 17

出版物シリーズ

名前Proceedings of the International Symposium on Electrical Insulating Materials
2020-September

Conference

Conference2020 International Symposium on Electrical Insulating Materials, ISEIM 2020
国/地域Japan
CityVirtual, Tokyo
Period20/9/1320/9/17

ASJC Scopus subject areas

  • 電子工学および電気工学
  • 電子材料、光学材料、および磁性材料

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