Micropatterning of polydiacetylene nanoparticle monolayer based on ultraviolet or electron beam polymerization

Daisuke Tanaka, Hisashi Karube, Masayuki Shimojo, Kotaro Kajikawa

研究成果: Article査読

1 被引用数 (Scopus)

抄録

A simple fabrication method is reported to obtain patterned polydiacetylene (PDA) nanoparticle (NP) monolayers, on the basis of polymerization of diacetylene NPs by UV light or electron beam (EB) irradiation. The UV patterning can be made within a resolution of 1.1 μm, using a mesh copper grid as a mask. The EB irradiation also brings about the polymerization, and patterned PDA NP monolayers were formed; however, the resolution of the patterning was lower than expected (∼2.5 μm), even using a narrow EB. Electron scattering, heating or defocusing will be the cause of the lower resolution.

本文言語English
論文番号121604
ジャーナルApplied Physics Express
4
12
DOI
出版ステータスPublished - 2011 12

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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