A simple fabrication method is reported to obtain patterned polydiacetylene (PDA) nanoparticle (NP) monolayers, on the basis of polymerization of diacetylene NPs by UV light or electron beam (EB) irradiation. The UV patterning can be made within a resolution of 1.1 μm, using a mesh copper grid as a mask. The EB irradiation also brings about the polymerization, and patterned PDA NP monolayers were formed; however, the resolution of the patterning was lower than expected (∼2.5 μm), even using a narrow EB. Electron scattering, heating or defocusing will be the cause of the lower resolution.
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