Micropatterning of polydiacetylene nanoparticle monolayer based on ultraviolet or electron beam polymerization

Daisuke Tanaka, Hisashi Karube, Masayuki Shimojo, Kotaro Kajikawa

研究成果: Article

1 引用 (Scopus)

抜粋

A simple fabrication method is reported to obtain patterned polydiacetylene (PDA) nanoparticle (NP) monolayers, on the basis of polymerization of diacetylene NPs by UV light or electron beam (EB) irradiation. The UV patterning can be made within a resolution of 1.1 μm, using a mesh copper grid as a mask. The EB irradiation also brings about the polymerization, and patterned PDA NP monolayers were formed; however, the resolution of the patterning was lower than expected (∼2.5 μm), even using a narrow EB. Electron scattering, heating or defocusing will be the cause of the lower resolution.

元の言語English
記事番号121604
ジャーナルApplied Physics Express
4
発行部数12
DOI
出版物ステータスPublished - 2011 12 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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