Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

Yi Zhao, Masahiro Toyama, Koji Kita, Kentaro Kyuno, Akira Toriumi

研究成果: Article査読

189 被引用数 (Scopus)

抄録

Effects of moisture absorption on permittivity and surface roughness of lanthanum oxide (La2 O3) films were investigated. It was found that the moisture absorption deteriorates the permittivity (k) of La2 O3 films on silicon because of the formation of hexagonal La (OH)3 with a low permittivity after films were exposed to the air. Therefore, the moisture absorption should be a very possible reason for the permittivity variation of La2 O3 film in literatures reported, so far. Furthermore, a roughness enhancement was also observed after La2 O3 films were exposed to the air for several hours. This observation should be another concern of hygroscopic La2 O3 film application.

本文言語English
論文番号072904
ジャーナルApplied Physics Letters
88
7
DOI
出版ステータスPublished - 2006
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(その他)

フィンガープリント

「Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル