Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

Yi Zhao, Masahiro Toyama, Koji Kita, Kentaro Kyuno, Akira Toriumi

研究成果: Article

173 引用 (Scopus)

抄録

Effects of moisture absorption on permittivity and surface roughness of lanthanum oxide (La2 O3) films were investigated. It was found that the moisture absorption deteriorates the permittivity (k) of La2 O3 films on silicon because of the formation of hexagonal La (OH)3 with a low permittivity after films were exposed to the air. Therefore, the moisture absorption should be a very possible reason for the permittivity variation of La2 O3 film in literatures reported, so far. Furthermore, a roughness enhancement was also observed after La2 O3 films were exposed to the air for several hours. This observation should be another concern of hygroscopic La2 O3 film application.

元の言語English
記事番号072904
ジャーナルApplied Physics Letters
88
発行部数7
DOI
出版物ステータスPublished - 2006
外部発表Yes

Fingerprint

lanthanum oxides
deterioration
moisture
oxide films
surface roughness
roughness
permittivity
augmentation
silicon
air

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

これを引用

Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon. / Zhao, Yi; Toyama, Masahiro; Kita, Koji; Kyuno, Kentaro; Toriumi, Akira.

:: Applied Physics Letters, 巻 88, 番号 7, 072904, 2006.

研究成果: Article

@article{cfbade71fc7942e7afe4db10109ea5d3,
title = "Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon",
abstract = "Effects of moisture absorption on permittivity and surface roughness of lanthanum oxide (La2 O3) films were investigated. It was found that the moisture absorption deteriorates the permittivity (k) of La2 O3 films on silicon because of the formation of hexagonal La (OH)3 with a low permittivity after films were exposed to the air. Therefore, the moisture absorption should be a very possible reason for the permittivity variation of La2 O3 film in literatures reported, so far. Furthermore, a roughness enhancement was also observed after La2 O3 films were exposed to the air for several hours. This observation should be another concern of hygroscopic La2 O3 film application.",
author = "Yi Zhao and Masahiro Toyama and Koji Kita and Kentaro Kyuno and Akira Toriumi",
year = "2006",
doi = "10.1063/1.2174840",
language = "English",
volume = "88",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "7",

}

TY - JOUR

T1 - Moisture-absorption-induced permittivity deterioration and surface roughness enhancement of lanthanum oxide films on silicon

AU - Zhao, Yi

AU - Toyama, Masahiro

AU - Kita, Koji

AU - Kyuno, Kentaro

AU - Toriumi, Akira

PY - 2006

Y1 - 2006

N2 - Effects of moisture absorption on permittivity and surface roughness of lanthanum oxide (La2 O3) films were investigated. It was found that the moisture absorption deteriorates the permittivity (k) of La2 O3 films on silicon because of the formation of hexagonal La (OH)3 with a low permittivity after films were exposed to the air. Therefore, the moisture absorption should be a very possible reason for the permittivity variation of La2 O3 film in literatures reported, so far. Furthermore, a roughness enhancement was also observed after La2 O3 films were exposed to the air for several hours. This observation should be another concern of hygroscopic La2 O3 film application.

AB - Effects of moisture absorption on permittivity and surface roughness of lanthanum oxide (La2 O3) films were investigated. It was found that the moisture absorption deteriorates the permittivity (k) of La2 O3 films on silicon because of the formation of hexagonal La (OH)3 with a low permittivity after films were exposed to the air. Therefore, the moisture absorption should be a very possible reason for the permittivity variation of La2 O3 film in literatures reported, so far. Furthermore, a roughness enhancement was also observed after La2 O3 films were exposed to the air for several hours. This observation should be another concern of hygroscopic La2 O3 film application.

UR - http://www.scopus.com/inward/record.url?scp=32944454322&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=32944454322&partnerID=8YFLogxK

U2 - 10.1063/1.2174840

DO - 10.1063/1.2174840

M3 - Article

AN - SCOPUS:32944454322

VL - 88

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 7

M1 - 072904

ER -