Monitoring reaction products of novolac resists during puddle development

Hideo Eto, Yasuhiro Ito, Tetsuya Homma

研究成果: Article査読

2 被引用数 (Scopus)

抄録

We have developed a new technique for monitoring the concentration of reaction products during puddle development in ultralarge-scale integration (ULSI) lithography. Optical measurement has been employed for monitoring the concentration of reaction products by detecting reflected light from a wafer surface, and compared with the sampling method (UV-visible spectroscopy) for reaction products from a developer solution. A correlation coefficient of 0.89 was obtained, indicating a good correlation between this optical method and sampling method. We concluded that the newly developed optical monitoring technique is useful for measuring the concentration of reaction products.

本文言語English
ページ(範囲)128-130
ページ数3
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
46
1
DOI
出版ステータスPublished - 2007 1 10

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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