Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling

K. Mitsuishi, Masayuki Shimojo, M. Tanaka, K. Furuya

研究成果: Article

6 引用 (Scopus)

抄録

A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

元の言語English
ページ(範囲)244-246
ページ数3
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
242
発行部数1-2
DOI
出版物ステータスPublished - 2006 1
外部発表Yes

Fingerprint

nanofabrication
Nanotechnology
Electron beams
Deposits
deposits
electron beams
Ions
High resolution electron microscopy
Masks
Nanostructures
crystallinity
electron microscopy
ions
masks
Fabrication
fabrication
energy
high resolution
Substrates

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

これを引用

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AU - Mitsuishi, K.

AU - Shimojo, Masayuki

AU - Tanaka, M.

AU - Furuya, K.

PY - 2006/1

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N2 - A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

AB - A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

KW - Electron-beam-induced deposition

KW - Ion-beam milling

KW - Nano-fabrication

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