Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling

K. Mitsuishi, M. Shimojo, M. Tanaka, K. Furuya

研究成果: Article査読

6 被引用数 (Scopus)

抄録

A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

本文言語English
ページ(範囲)244-246
ページ数3
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
242
1-2
DOI
出版ステータスPublished - 2006 1 1
外部発表はい

ASJC Scopus subject areas

  • 核物理学および高エネルギー物理学
  • 器械工学

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