Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling

K. Mitsuishi, M. Shimojo, M. Tanaka, K. Furuya

研究成果: Article

6 引用 (Scopus)

抜粋

A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.

元の言語English
ページ(範囲)244-246
ページ数3
ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
242
発行部数1-2
DOI
出版物ステータスPublished - 2006 1 1

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

フィンガープリント Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用