Electron-beam-induced deposition is a promising technique for producing position-controlled nanometer-sized structures without using masks. In this study, electron-beam-induced deposition was carried out using iron carbonyl, and nanometer-sized dots and freestanding rods were fabricated. The nanostructures were characterized by scanning and transmission electron microscopy. The size of the nanodots as a function of beam irradiation time, and the width of the freestanding rods as a function of beam scan speed are reported. Nanocrystal formation under an area scan is also reported.
|ジャーナル||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|出版ステータス||Published - 2005 7月 26|
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