抄録
Electron-beam-induced deposition is a promising technique for producing position-controlled nanometer-sized structures without using masks. In this study, electron-beam-induced deposition was carried out using iron carbonyl, and nanometer-sized dots and freestanding rods were fabricated. The nanostructures were characterized by scanning and transmission electron microscopy. The size of the nanodots as a function of beam irradiation time, and the width of the freestanding rods as a function of beam scan speed are reported. Nanocrystal formation under an area scan is also reported.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 5651-5653 |
| ページ数 | 3 |
| ジャーナル | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| 巻 | 44 |
| 号 | 7 B |
| DOI | |
| 出版ステータス | Published - 2005 7月 26 |
| 外部発表 | はい |
ASJC Scopus subject areas
- 工学（全般）
- 物理学および天文学（全般）