Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing

H. Nishikawa, T. Nishiura, T. Mita, T. Takemori

研究成果: Article › 査読

本文言語	English
ジャーナル	International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB
出版ステータス	Published - 2011 6月 1

引用スタイル

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title = "Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing",

author = "H. Nishikawa and T. Nishiura and T. Mita and T. Takemori",

year = "2011",

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language = "English",

journal = "International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB",

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AU - Mita, T.

AU - Takemori, T.

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JO - International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB

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