| 元の言語 | English |
|---|---|
| ジャーナル | International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB |
| 出版物ステータス | Published - 2011 6 1 |
これを引用
Nishikawa, H., Nishiura, T., Mita, T., & Takemori, T. (2011). Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing. International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB.
Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing. / Nishikawa, H.; Nishiura, T.; Mita, T.; Takemori, T.
：: International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB, 01.06.2011.研究成果: Article
Nishikawa, H, Nishiura, T, Mita, T & Takemori, T 2011, 'Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing', International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB.
Nishikawa H, Nishiura T, Mita T, Takemori T. Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing. International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB. 2011 6 1.
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title = "Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing",
author = "H. Nishikawa and T. Nishiura and T. Mita and T. Takemori",
year = "2011",
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day = "1",
language = "English",
journal = "International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB",
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T1 - Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing
AU - Nishikawa, H.
AU - Nishiura, T.
AU - Mita, T.
AU - Takemori, T.
PY - 2011/6/1
Y1 - 2011/6/1
M3 - Article
JO - International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB
JF - International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB
ER -