Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing

H. Nishikawa, T. Nishiura, T. Mita, T. Takemori

研究成果: Article

元の言語English
ジャーナルInternational Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB
出版物ステータスPublished - 2011 6 1

これを引用

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title = "Negative Epoxy Resist for Permanent Use Optimized for Proton Beam Writing",
author = "H. Nishikawa and T. Nishiura and T. Mita and T. Takemori",
year = "2011",
month = "6",
day = "1",
language = "English",
journal = "International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB",

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AU - Nishikawa, H.

AU - Nishiura, T.

AU - Mita, T.

AU - Takemori, T.

PY - 2011/6/1

Y1 - 2011/6/1

M3 - Article

JO - International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB

JF - International Conference on Materials for Advanced Technologies (ICMAT2011), Symposium BB

ER -