In this paper we report fabrication of high-aspect-ratio micro-structure of Ni by electroplating, using a micro-machining technique of resists using proton beam writing (PBW) at Japan Atomic Energy Agency (JAEA). A micro-structure of 5 μm thick PMMA was fabricated by exposure using PBW at 1.7 MeV and by development. A Ni structure was then formed by electroplating on the micro-structure of PMMA. Vertical and smooth side walls observed by a scanning electron microscope (SEM) indicate that PBW can be a versatile tool for fabrication of resists and metal microstructure in combination with electroplating. The electroplated Ni structure can be used as a resolution standard, which enabled us to focus the proton beam down to 130 nm.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Hardware and Architecture
- Electrical and Electronic Engineering