Novel quaternary AlInGaN/GaN heterostructure field effect transistors on sapphire substrate

Yang Liu, Takashi Egawa, Hao Jiang, Baijun Zhang, Hiroyasu Ishikawa

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Undoped quaternary AlxIn0.02Ga0.98-xN/GaN heterostructure field effect transistors (HFET) with different Al mole fractions were fabricated on sapphire substrate. An enhancement in two-dimensional electron gas density with increasing the Al mole fractions was observed. The properties of HFETs revealed that, with the Al incorporation, both maximum transconductance (gmmax) and drain current (Idmax) increased up to 138 mS/mm and 1230 mA/mm, respectively, for the device with 2 μm gate length. In addition, the threshold voltage strongly depended on Al mole fraction, by which normally-off HFET was demonstrated on a low Al-contained sample. No breakdown was observed for all the AlxIn 0.02Ga0.98-xN/GaN HFETs when the gate-drain reverse bias was applied up to 100 V. The results indicate that quaternary AlInGaN is a promising candidate for high power and high frequency device applications.

本文言語English
ページ(範囲)5728-5731
ページ数4
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
45
7
DOI
出版ステータスPublished - 2006 7 7
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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