TY - JOUR
T1 - Observation of quill effect induced by distortion of spatial beam profile
AU - Matsuo, Shigeki
AU - Umeda, Kei Enjo Yoshifumi
AU - Hashimoto, Shuichi
PY - 2013
Y1 - 2013
N2 - Femtosecond laser modification was carried out for silica substrates using spatially distorted pulses. Modified lines were inscribed in the alternative scanning directions. Etching of the sample revealed significant difference in etching rate, representing Quill effect. Also, the etching rates were affected by the distortion of the spatial beam profile. These results suggest the possibility to control the characteristics of the modified region by controlling the beam profile.
AB - Femtosecond laser modification was carried out for silica substrates using spatially distorted pulses. Modified lines were inscribed in the alternative scanning directions. Etching of the sample revealed significant difference in etching rate, representing Quill effect. Also, the etching rates were affected by the distortion of the spatial beam profile. These results suggest the possibility to control the characteristics of the modified region by controlling the beam profile.
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U2 - 10.1051/matecconf/20130801006
DO - 10.1051/matecconf/20130801006
M3 - Conference article
AN - SCOPUS:84903129404
SN - 2261-236X
VL - 8
JO - MATEC Web of Conferences
JF - MATEC Web of Conferences
M1 - 01006
T2 - Workshop on Progress in Ultrafast Laser Modifications of Materials, 2013
Y2 - 14 April 2013 through 19 April 2013
ER -