Observation of quill effect induced by distortion of spatial beam profile

Shigeki Matsuo, Kei Enjo Yoshifumi Umeda, Shuichi Hashimoto

研究成果: Conference article査読

抄録

Femtosecond laser modification was carried out for silica substrates using spatially distorted pulses. Modified lines were inscribed in the alternative scanning directions. Etching of the sample revealed significant difference in etching rate, representing Quill effect. Also, the etching rates were affected by the distortion of the spatial beam profile. These results suggest the possibility to control the characteristics of the modified region by controlling the beam profile.

本文言語English
論文番号01006
ジャーナルMATEC Web of Conferences
8
DOI
出版ステータスPublished - 2013
外部発表はい
イベントWorkshop on Progress in Ultrafast Laser Modifications of Materials, 2013 - Cargese, France
継続期間: 2013 4 142013 4 19

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Engineering(all)

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