Observation of quill effect induced by distortion of spatial beam profile

Shigeki Matsuo, Kei Enjo Yoshifumi Umeda, Shuichi Hashimoto

研究成果: Conference article

抜粋

Femtosecond laser modification was carried out for silica substrates using spatially distorted pulses. Modified lines were inscribed in the alternative scanning directions. Etching of the sample revealed significant difference in etching rate, representing Quill effect. Also, the etching rates were affected by the distortion of the spatial beam profile. These results suggest the possibility to control the characteristics of the modified region by controlling the beam profile.

元の言語English
記事番号01006
ジャーナルMATEC Web of Conferences
8
DOI
出版物ステータスPublished - 2013 1 1
イベントWorkshop on Progress in Ultrafast Laser Modifications of Materials, 2013 - Cargese, France
継続期間: 2013 4 142013 4 19

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ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Engineering(all)

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