Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane

K. Ishii, Y. Ohki, H. Nishikawa

研究成果: Article

20 引用 (Scopus)
元の言語English
ページ(範囲)5418-5422
ジャーナルJournal of Applied Physics
76
出版物ステータスPublished - 1994 11 1

これを引用

@article{1fe81d0ecebd4d22a6fb6969a51a9960,
title = "Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane",
author = "K. Ishii and Y. Ohki and H. Nishikawa",
year = "1994",
month = "11",
day = "1",
language = "English",
volume = "76",
pages = "5418--5422",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane

AU - Ishii, K.

AU - Ohki, Y.

AU - Nishikawa, H.

PY - 1994/11/1

Y1 - 1994/11/1

M3 - Article

VL - 76

SP - 5418

EP - 5422

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

ER -