Optical isolator with Si guiding layer fabricated by photosensitive adhesive bonding

Hideki Yokoi, S. Choowitsakunlert, K. Kobayashi, K. Takagiwa

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

An optical isolator employing a nonreciprocal guided-radiation mode conversion is described. The optical isolator composes of a magneto-optic waveguide with a Si guiding layer, which can be realized by photosensitive adhesive bonding. The optical isolator was designed at a wavelength of 1.55 μm. Relationship of waveguide parameters was clarified for isolator operation. Dependence of the thickness of an adhesive layer was investigated for the design of the optical isolator.

本文言語English
ホスト出版物のタイトルSemiconductor Wafer Bonding: Science, Technology and Applications 14
出版社Electrochemical Society Inc.
ページ215-220
ページ数6
75
9
ISBN(電子版)9781607685395
DOI
出版ステータスPublished - 2016
イベントSymposium on Semiconductor Wafer Bonding: Science, Technology and Applications 14 - PRiME 2016/230th ECS Meeting - Honolulu, United States
継続期間: 2016 10 22016 10 7

Other

OtherSymposium on Semiconductor Wafer Bonding: Science, Technology and Applications 14 - PRiME 2016/230th ECS Meeting
CountryUnited States
CityHonolulu
Period16/10/216/10/7

ASJC Scopus subject areas

  • Engineering(all)

フィンガープリント 「Optical isolator with Si guiding layer fabricated by photosensitive adhesive bonding」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル