Optical isolator with Si guiding layer fabricated by uv-activated bonding

H. Yokoi, K. Sasaki

研究成果: Conference contribution

2 引用 (Scopus)

抜粋

An interferometric optical isolator, with a Si guiding layer, employing a nonreciprocal phase shift has been studied. The optical isolator is comprised of a magneto-optic waveguide with a magnetic garnet/Si/SiO2 structure, which is fabricated by wafer bonding technique. The nonreciprocal phase shift was calculated for magneto-optic waveguides with various layer structures. Wafer bonding between a garnet crystal and Si was also investigated.

元の言語English
ホスト出版物のタイトルECS Transactions - Semiconductor Wafer Bonding 10
ホスト出版物のサブタイトルScience, Technology, and Applications
ページ155-161
ページ数7
エディション8
DOI
出版物ステータスPublished - 2008 12 1
イベントSemiconductor Wafer Bonding 10: Science, Technology, and Applications - 214th ECS Meeting - Honolulu, HI, United States
継続期間: 2008 10 142008 10 16

出版物シリーズ

名前ECS Transactions
番号8
16
ISSN(印刷物)1938-5862
ISSN(電子版)1938-6737

Conference

ConferenceSemiconductor Wafer Bonding 10: Science, Technology, and Applications - 214th ECS Meeting
United States
Honolulu, HI
期間08/10/1408/10/16

ASJC Scopus subject areas

  • Engineering(all)

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  • これを引用

    Yokoi, H., & Sasaki, K. (2008). Optical isolator with Si guiding layer fabricated by uv-activated bonding. : ECS Transactions - Semiconductor Wafer Bonding 10: Science, Technology, and Applications (8 版, pp. 155-161). (ECS Transactions; 巻数 16, 番号 8). https://doi.org/10.1149/1.2982865