Optical isolator with Si guiding layer fabricated by uv-activated bonding

H. Yokoi, K. Sasaki

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

An interferometric optical isolator, with a Si guiding layer, employing a nonreciprocal phase shift has been studied. The optical isolator is comprised of a magneto-optic waveguide with a magnetic garnet/Si/SiO2 structure, which is fabricated by wafer bonding technique. The nonreciprocal phase shift was calculated for magneto-optic waveguides with various layer structures. Wafer bonding between a garnet crystal and Si was also investigated.

本文言語English
ホスト出版物のタイトルECS Transactions - Semiconductor Wafer Bonding 10
ホスト出版物のサブタイトルScience, Technology, and Applications
ページ155-161
ページ数7
8
DOI
出版ステータスPublished - 2008 12 1
イベントSemiconductor Wafer Bonding 10: Science, Technology, and Applications - 214th ECS Meeting - Honolulu, HI, United States
継続期間: 2008 10 142008 10 16

出版物シリーズ

名前ECS Transactions
番号8
16
ISSN(印刷版)1938-5862
ISSN(電子版)1938-6737

Conference

ConferenceSemiconductor Wafer Bonding 10: Science, Technology, and Applications - 214th ECS Meeting
CountryUnited States
CityHonolulu, HI
Period08/10/1408/10/16

ASJC Scopus subject areas

  • Engineering(all)

フィンガープリント 「Optical isolator with Si guiding layer fabricated by uv-activated bonding」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル