抄録
A method of analysis of spectroscopic ellipsometry (SE) measurement data is proposed for AlxGa1-xN/GaN heterostructures grown on sapphire substrates. The SE data measured at three angles of incidence, 40°, 50°, and 60°, are simultaneously fitted assuming the dielectric function to consist of a Sellmeir dispersion equation and a free-exciton absorption term. The refractive index n and the extinction coefficient k of undoped AlxGa1-xN films are determined in the spectral range of 1.5-4.13 eV of photon energy. The transition energy of the free exciton, which is in excellent agreement with the reported results for GaN in a previous paper, is found to vary from 3.44 to 3.95 eV when the composition x varies from 0 to 0.151. The refractive index n of AlxGa1-xN has also been compared with those reported results.
本文言語 | English |
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ページ(範囲) | 2202-2204 |
ページ数 | 3 |
ジャーナル | Applied Physics Letters |
巻 | 72 |
号 | 18 |
DOI | |
出版ステータス | Published - 1998 |
外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学(その他)