Patterning of permalloy thin films by means of electron-beam lithography and focused ion-beam milling

S. Getlawi, M. R. Koblischka, U. Hartmann, C. Richter, T. Sulzbach

研究成果: Article査読

5 被引用数 (Scopus)

抄録

Focused ion-beam milling has been employed to structure magnetic nanoelements from 20 nm thick films of permalloy (Ni81Fe19). Rectangles are patterned into permalloy thin films grown on Si substrates by means of electron-beam lithography and focused ion-beam (FIB) milling down to 100 nm dimensions. In this study, we analyse the effect of the FIB milling parameters (ion current, spot size, dose) on the resulting magnetic domain structures. The ion currents have been varied between 10 pA and 10 000 pA; the dose of the ion beam used for milling was varied in order to achieve the best definition for the milled areas. The resulting edges of the permalloy structures are characterized by means of AFM. We find that a small ion dose does not affect the resulting magnetic domain patterns in the structures, so FIB milling can be applied to create high-quality permalloy nanostructures.

本文言語English
ページ(範囲)699-704
ページ数6
ジャーナルSuperlattices and Microstructures
44
4-5
DOI
出版ステータスPublished - 2008 10月
外部発表はい

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 電子工学および電気工学

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