We propose a novel patterning technique for gold nanoparticles on substrates that combines a chemical reaction with electron beam irradiation. First, gold nanoparticles are placed in a two-dimensional arrangement on the substrate. Then, particular nanoparticles are fixed on the substrate by irradiation with a focused electron beam to produce a desired pattern. Finally, the unfixed nanoparticles are removed. Using this technique, an array of gold nanoparticles, for example, in the form of a line or patterned over an area, are prepared on the substrate. This technique could contribute to the fabrication of plasmonic devices and other applications that require the controlled placement of gold nanoparticles on substrates.
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