Photo-electrochemical deposition of platinum on TiO2 with resolution of twenty nanometers using a mask elaborated with electron-beam lithography

Saulius Juodkazis, Akira Yamaguchi, Hidekazu Ishii, Shigeki Matsuo, Hitoshi Takagi, Hiroaki Misawa

研究成果: Article

11 引用 (Scopus)

抄録

We report the patterning of Pt on a TiO2-rutile single crystal (the fundamental absorption band starts at 396 nm) by direct deposition from a water solution of H2PtCl6 (10-20 mmol/dm3) using laser beam writing at 390-396 nm, or by Hg-lamp illumination (i-line at 365 nm). Pt deposition was corroborated by microchemical analysis. A resolution of the Pt pattern down to 20-30 nm was achieved. To create a Pt pattern with resolution of twenty nanometers, we employed a mask elaborated with electron-beam (EB) drawing lithography. The mask was transparent to the writing illumination. The Pt was reduced from the solution by laser scanning over resist-covered regions, while the pattern was formed in the openings of the resist. Separation of the growth and illumination regions, typically, by 0.5-2 μm, facilitates the deposition of reproducible, high-aspect-ratio patterns. It is demonstrated that Pt was deposited through a process of diffusion on the light-excited carriers. The possibility of fabrication of a three-dimensional Pt pattern by the overgrowth of the resist is discussed.

元の言語English
ページ(範囲)4246-4251
ページ数6
ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
40
発行部数6 A
出版物ステータスPublished - 2001 6
外部発表Yes

Fingerprint

Electron beam lithography
Masks
Platinum
platinum
masks
lithography
Lighting
electron beams
illumination
Electric lamps
Lithography
Laser beams
Aspect ratio
Absorption spectra
Electron beams
Single crystals
Scanning
Fabrication
high aspect ratio
Lasers

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

これを引用

@article{a91a5a52887a490d9bbba49bbda9e23c,
title = "Photo-electrochemical deposition of platinum on TiO2 with resolution of twenty nanometers using a mask elaborated with electron-beam lithography",
abstract = "We report the patterning of Pt on a TiO2-rutile single crystal (the fundamental absorption band starts at 396 nm) by direct deposition from a water solution of H2PtCl6 (10-20 mmol/dm3) using laser beam writing at 390-396 nm, or by Hg-lamp illumination (i-line at 365 nm). Pt deposition was corroborated by microchemical analysis. A resolution of the Pt pattern down to 20-30 nm was achieved. To create a Pt pattern with resolution of twenty nanometers, we employed a mask elaborated with electron-beam (EB) drawing lithography. The mask was transparent to the writing illumination. The Pt was reduced from the solution by laser scanning over resist-covered regions, while the pattern was formed in the openings of the resist. Separation of the growth and illumination regions, typically, by 0.5-2 μm, facilitates the deposition of reproducible, high-aspect-ratio patterns. It is demonstrated that Pt was deposited through a process of diffusion on the light-excited carriers. The possibility of fabrication of a three-dimensional Pt pattern by the overgrowth of the resist is discussed.",
keywords = "Laser-assisted deposition, Microfabrication, Platinum, Titania",
author = "Saulius Juodkazis and Akira Yamaguchi and Hidekazu Ishii and Shigeki Matsuo and Hitoshi Takagi and Hiroaki Misawa",
year = "2001",
month = "6",
language = "English",
volume = "40",
pages = "4246--4251",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "6 A",

}

TY - JOUR

T1 - Photo-electrochemical deposition of platinum on TiO2 with resolution of twenty nanometers using a mask elaborated with electron-beam lithography

AU - Juodkazis, Saulius

AU - Yamaguchi, Akira

AU - Ishii, Hidekazu

AU - Matsuo, Shigeki

AU - Takagi, Hitoshi

AU - Misawa, Hiroaki

PY - 2001/6

Y1 - 2001/6

N2 - We report the patterning of Pt on a TiO2-rutile single crystal (the fundamental absorption band starts at 396 nm) by direct deposition from a water solution of H2PtCl6 (10-20 mmol/dm3) using laser beam writing at 390-396 nm, or by Hg-lamp illumination (i-line at 365 nm). Pt deposition was corroborated by microchemical analysis. A resolution of the Pt pattern down to 20-30 nm was achieved. To create a Pt pattern with resolution of twenty nanometers, we employed a mask elaborated with electron-beam (EB) drawing lithography. The mask was transparent to the writing illumination. The Pt was reduced from the solution by laser scanning over resist-covered regions, while the pattern was formed in the openings of the resist. Separation of the growth and illumination regions, typically, by 0.5-2 μm, facilitates the deposition of reproducible, high-aspect-ratio patterns. It is demonstrated that Pt was deposited through a process of diffusion on the light-excited carriers. The possibility of fabrication of a three-dimensional Pt pattern by the overgrowth of the resist is discussed.

AB - We report the patterning of Pt on a TiO2-rutile single crystal (the fundamental absorption band starts at 396 nm) by direct deposition from a water solution of H2PtCl6 (10-20 mmol/dm3) using laser beam writing at 390-396 nm, or by Hg-lamp illumination (i-line at 365 nm). Pt deposition was corroborated by microchemical analysis. A resolution of the Pt pattern down to 20-30 nm was achieved. To create a Pt pattern with resolution of twenty nanometers, we employed a mask elaborated with electron-beam (EB) drawing lithography. The mask was transparent to the writing illumination. The Pt was reduced from the solution by laser scanning over resist-covered regions, while the pattern was formed in the openings of the resist. Separation of the growth and illumination regions, typically, by 0.5-2 μm, facilitates the deposition of reproducible, high-aspect-ratio patterns. It is demonstrated that Pt was deposited through a process of diffusion on the light-excited carriers. The possibility of fabrication of a three-dimensional Pt pattern by the overgrowth of the resist is discussed.

KW - Laser-assisted deposition

KW - Microfabrication

KW - Platinum

KW - Titania

UR - http://www.scopus.com/inward/record.url?scp=0035358694&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035358694&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0035358694

VL - 40

SP - 4246

EP - 4251

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 6 A

ER -