Photoluminescence characterization of defects in thermal oxide

Hiroyuki Nishikawa, James H. Stathis

研究成果: Conference article査読

抄録

Defects in thermal oxides were investigated by a photoluminescence technique. Thermal oxides with a thickness of 100 nm grown either by dry or wet oxidation were studied. A broad PL band at 2-4 eV was observed for both dry and wet oxides. Effects of annealing under vacuum or in atmospheres of Ar or N2 on the PL were also examined. The PL intensity was enhanced for the case of wet oxide by vacuum annealing at 700 °C. High-temperature anneal above 750 °C without O2 further generated PL centers for both dry and wet oxides. The formation mechanism of the PL centers will be discussed in terms of the decomposition of oxide at Si/SiO2 interface.

本文言語English
ページ(範囲)289-294
ページ数6
ジャーナルMaterials Research Society Symposium - Proceedings
592
出版ステータスPublished - 2000 12 1
外部発表はい
イベントStructure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures - Boston, MA, USA
継続期間: 1999 11 291999 12 1

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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