Physical simulation and visualization of the Marangoni convection inside meniscus region under IPA vapor in wafer drying process

N. Ono, T. Yamada, S. Miura, T. Ishibashi, H. Matsuo, K. Watanabe

研究成果: Conference contribution

抄録

In cleaning and drying processes after chemical mechanical polishing process, there is a method of flowing pure water to a rotating wafer, and simultaneously supplying IPA (Iso-Propyl Alcohol) vapor to the meniscus region (this is known as Rotagoni drying). This method causes a surface tension difference on the liquid surface and then drives fluid convection by the Marangoni effect, which is thought to efficiently remove impure particles on the wafer surface. During the impingement of IPA vapor to the meniscus region, in-situ observation of Marangoni convection is technically difficult. In this study, physical simulation by creating a simplified two-dimensional flow was performed. Using MEMS device technique, a two-dimensional flow channel was created, and pure water and IPA vapor was supplied to reproduce the situation, and the flow was visualized by utilizing PIV (Particle Image Velocimetry) method. The flow velocities and the flow patterns were successfully obtained from the image analysis. The surface flow with IPA vapor was in the reversed direction of that with only nitrogen gas, and the velocity became larger.

本文言語English
ホスト出版物のタイトル16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019
編集者Koichiro Saga, Paul W. Mertens, Takeshi Hattori, Jerzy Ruzyllo, Anthony J. Muscat
出版社Electrochemical Society Inc.
ページ107-116
ページ数10
2
ISBN(電子版)9781607685395
DOI
出版ステータスPublished - 2019
イベント16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 - 236th ECS Meeting - Atlanta, United States
継続期間: 2019 10 132019 10 17

出版物シリーズ

名前ECS Transactions
番号2
92
ISSN(印刷版)1938-6737
ISSN(電子版)1938-5862

Conference

Conference16th International Symposium on Semiconductor Cleaning Science and Technology, SCST 2019 - 236th ECS Meeting
CountryUnited States
CityAtlanta
Period19/10/1319/10/17

ASJC Scopus subject areas

  • Engineering(all)

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