Plasma polymerization for protein patterning: Reversible formation with fullerene modification

Hayato Takahashi, Naoya Murata, Hitoshi Muguruma

研究成果: Article査読

抄録

Partial plasma polymerization for coexistence of hydrophobic/ hydrophilic area in several ten micrometer size is the typical technique for protein patterning. A hydrophobic hexamethyldisiloxane plasma-polymerized film (HMDS PPF) was deposited on a glass substrate and this surface was partially modified by subsequent nitrogen plasma treatment (hydrophilic surface, HMDS-N PPF) with a patterned shadow mask. An antibody protein (F(ab')2 fragment of anti-human immunoglobulin G) was selectively adsorbed onto the HMDS-N area and was not adsorbed onto the HMDS area. Distinct 80×80 μm2 square spots surrounded by a non-protein adsorbed 80 μm-wide grid were observed. Then, when the protein modified by fullerene was used, the reversible patterning was obtained. This indicated that the modification by fullerene changed the hydrophilic nature of F(ab')2 protein to hydrophobic one, as a result, the modified protein was selectively adsorbed onto hydrophobic area.

本文言語English
ページ(範囲)211-213
ページ数3
ジャーナルIEICE Transactions on Electronics
E93-C
2
DOI
出版ステータスPublished - 2010 1 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学

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